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UHNF
  • Microfabrication
    • Lithography
      • Electron Beam Lithography
      • Nanoimprint Lithography
      • Photolithography
      • KLayout
        • Graph Digitizer
    • Deposition
      • Electron Beam Evaporation
      • Sputtering
      • Sputter Coating
      • Spin Coating
    • Etching
      • Ion Milling
      • Reactive Ion Etching
      • Wet Etching
    • Others
      • Annealing
      • Rapid Thermal Processing
      • UV Ozone Cleaning
    • Processes
    • Pythography
  • Microscopy
    • Atomic Force Microscopy
    • Scanning Electron Microscopy
    • Focused Ion Beam
    • Profilometry: Optical 3D
  • Services
    • Fabrication
    • Project Assessment
    • Technology Development
      • Controls and Automation
      • Core Technology
      • Software
    • Lab Management
      • Standard Operating Procedure
      • Standard Servicing Procedure
    • Printed Circuit Board
  • Gallery
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    • Scheduler
    • Training Request
  • Menu
    • About Us
    • Cleanroom Facility
    • Contact Us
    • Maps and Parking
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Search this website
  • Microfabrication
    • Lithography
      • Electron Beam Lithography
      • Nanoimprint Lithography
      • Photolithography
      • KLayout
        • Graph Digitizer
    • Deposition
      • Electron Beam Evaporation
      • Sputtering
      • Sputter Coating
      • Spin Coating
    • Etching
      • Ion Milling
      • Reactive Ion Etching
      • Wet Etching
    • Others
      • Annealing
      • Rapid Thermal Processing
      • UV Ozone Cleaning
    • Processes
    • Pythography
  • Microscopy
    • Atomic Force Microscopy
    • Scanning Electron Microscopy
    • Focused Ion Beam
    • Profilometry: Optical 3D
  • Services
    • Fabrication
    • Project Assessment
    • Technology Development
      • Controls and Automation
      • Core Technology
      • Software
    • Lab Management
      • Standard Operating Procedure
      • Standard Servicing Procedure
    • Printed Circuit Board
  • Gallery
  • Become a Member
    • Rates
    • Scheduler
    • Training Request
  • Menu
    • About Us
    • Cleanroom Facility
    • Contact Us
    • Maps and Parking
  • Toggle website search
  • Photolithography
    • Exposure System
    • Photomask
  • Electron Beam Lithography
    • Beam Positioning
    • Beam Shaping
    • Height Compensation
    • Pattern Fracturing
    • Proximity Effect
    • Writing
  • Sputtering
    • Base Pressure
    • System Geometry
    • Uniformity
  • Ion Milling
    • Sample Heating
    • Source Profile
    • Uniformity

Ion Milling is used to etch materials indiscriminately.

Business Hours

MONDAY — FRIDAY:
8:00 AM — 6:00 PM

Contact Us

  • lvchang@central.uh.edu
  • 3617 Cullen Blvd
    SERC Room E1007A
    Houston, TX 77204

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