Electron Beam Evaporation

Electron beam evaporation is a technique for depositing a variety of materials onto a substrate. This is achieved by focusing a beam of electrons into a tiny spot and directing it towards a material in the crucible inside a vacuum chamber. The electron beam heats up the material until it evaporates, coating everything inside the vacuum chamber. This technique can deposit materials at a rate of up to 1 [nm/s].

Thermionics eBeam Evaporator

DescriptionSpecification
Sample Size3" Wafer or
4" Wafer or
Custom Size
Deposition Rate0 to 2 [nm/s]
Sources6
MaterialAu, Co, Cr, Cu, W
Temperature< 3500 [°C]
Beam Size0.125"
Beam SweepYes
Sample Distance30 [cm]

Examples

Core Technology

Core TechnologyDescription
SOP: Custom Thermionics Ebeam EvaporatorThis document is the standard operating procedure (SOP) for the custom Thermionics electron beam evaporation system at UHNF. This SOP serves as a foundation for initial training and ensures that the equipment can be operated correctly, by everyone, the first time.
SSP: Custom Thermionics Ebeam EvaporatorThis is a service manual we developed for the custom Thermionics electron beam evaporation system at UHNF. This document ensures that any staff can effectively perform routine service or repairs effectively, quickly and at significantly lower cost. This document is restricted to equipment custodians. Contact us for access.

Guide

GuideDescription

Equipment Name