Ion Milling

Ion milling is a technique for subtracting materials from a sample. This is achieved by bombarding the sample with argon, causing the atoms on the surface of the sample to vaporize. This technique can remove materials at a rate of up to 1 [nm/s].


Sample Size3" Wafer or
4" Wafer or
Custom Size
Mill Rate0 to 2 [nm/s]
Beam Energy0 to 600 [V]
Beam Current Density0 to 20 [W/cm2]
Uniformity< 2%
Sample Distance30 [cm]

Core Technology

Core TechnologyDescription
SOP: KRI KDC75This document is the standard operating procedure (SOP) for the KRI KDC75 ion mill system at UHNF. This SOP serves as a foundation for initial training and ensures that the equipment can be operated correctly, by everyone, the first time.
UniformityThe ion milling uniformity is an important process parameter to characterize to ensure an entire wafer is milled at the same rate.
Rate CalculatorUse this rate calculator to estimate the ion milling rate for your material.
SSP: KRI KDC75This document is the standard service procedure (SSP) for the KRI KDC75 ion mill system at UHNF. This SSP ensures that any staff can effectively perform routine service or repairs correctly, the first time. This document is restricted to equipment custodians. Contact us for access.


Process DevelopmentLearn how to develop a robust electron beam lithography process and contribute towards making nanofabrication technology more accessible.
RateLearn how the ion milling rate depends on the material and ion beam energy.
Sample HeatingLearn how ion milling can heat up the sample which can cause material properties to change and melt polymers.
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