Nanoimprint lithography uses pressure and energy (heat or UV light) to replicate a mold pattern in a thin film of media. The mold has raised structures that displaces the media when pressed together. Heat is often used to soften the media to facilitate its displacement. When the heat is removed, the media solidifies into an exact negative replica of the mold. This process is capable of making replicas with 10 nanometer resolution.
Nanoimprint lithography can produce the same pattern as electron beam lithography at significantly less cost and requires less skill. This is achieved by delegating the task of fabricating the mold using electron beam lithography to professionals. A nanoimprint mold can be purchased from a company or from UHNF. Alternatively, a researcher at UHNF can use our core technology to fabricate their own nanoimprint mold.